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Research Article - (2016) Volume 0, Issue 0

Study on the Effect of Plasma Treatment on Flat-band-voltage and Equivalent Oxide Thickness using Metal-organic Chemical Vapor Deposition TiN Film as p-MOSFETS Metal Gate Electrode

Jianfeng Gao*, Hong Yang, Guobin Bai, Junfeng Li and Chao Zhao
Institute of Microelectronics Chinese Academy of Sciences, No. 3, Bei-Tu-Cheng West Road, Beijing, 100029, China
*Corresponding Author: